MNT-HP 200 Photo-lithography Hot Plate – MicroNano Tools
MNT-HP 200 Photo-lithography Hot Plate – MicroNano Tools
General Introduction The MNT-HP-200 is a compact and easy-to-use photolithography hot plate. It is used in prebake, postbake, and hardbake of the photolithographic process. This product features high baking speed, uniformity, high temperature control accuracy, and highly repeatable experimental results. Baking control is designed for prebake, postbake, and hardbake for photo-etching process. Together with BSC-100 spin-coater, the HP-200 hot plate is a perfect tool to fabricate metal oxide thin films, polymer coatings and metal organic thin films on silicon wafers or other substrates. Ramp programmable control function available as an option. Comparing with conventional oven, using hotplate to cure the films will result in reduced baking time, increased reproducibility, and more uniform and better film quality. It is because the HP-200 has a uniform temperature profile across the substrate and provides even heating to the films and coatings. The skin effect will be
Sawatec HP-200 hot plates ‒ Center of MicroNanoTechnology CMi ‐ EPFL
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MNT-HP 200 Photo-lithography Hot Plate – MicroNano Tools
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MNT-HP 200 Photo-lithography Hot Plate – MicroNano Tools
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